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Ionized Cluster Beam (ICB) deposition is a thin film deposition technique that combines the principles of molecular beam epitaxy and ion beam methods to achieve precise control over film composition and structure at the nanoscale. The setup consists of three main parts: the cluster source, the ionization chamber, and the deposition chamber. In the cluster source, the material to be ______ __________ _______ ___ ________ _______ __________ ____.
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